Probe:	DSCAML1 probe2
Probe preparation:	Antisense labelled with S35 RNA
Visualized with:	Autoradiography

Structure	Level	Pattern	Image	Note
TS20: spinal cord	Present	Graded	2Ab	Dorsal expression predominates.

Structure	Level	Pattern	Image	Note
TS20: spinal cord	Present	Graded	2Bg	Dorsal expression predominates along the rostro-caudal axis of the spinal cord.

Structure	Level	Pattern	Image	Note
TS20: spinal cord	Present	Graded	2Bl	Dorsal expression predominates along the rostro-caudal axis of the spinal cord.

Structure	Level	Pattern	Image	Note
TS17: future spinal cord	Absent		3b

Structure	Level	Pattern	Image	Note
TS19: future spinal cord	Present	Regionally restricted	3d	Expression is present in two distinct bands. It is present in the neuroepithelial cells of the dorsal neural tube, cells which will migrate to form the dorsal horns, the spinocerebral tract, and the autonomic system.

Structure	Level	Pattern	Image	Note
TS20: spinal cord	Present	Graded	3f	Expression in the dorsal sensory cells predominates.

Structure	Level	Pattern	Image	Note
TS23: spinal cord	Present	Graded		Expression in the dorsal sensory cells predominates.

Structure	Level	Pattern	Image	Note
TS26: spinal cord	Present	Uniform	3h	Expression is present throughout the spinal cord, with no distinct ventral/dorsal gradient.

Structure	Level	Pattern	Image	Note
TS28: spinal cord	Trace		3j	Expression is barely detectable above background.

Structure	Level	Pattern	Image	Note
TS19: telencephalon	Strong	Regionally restricted		Expression is present in the preplate plexus, particularly in the Cajal-Retzius cells.
TS19: telencephalon ventricular layer	Present

Structure	Level	Pattern	Image	Note
TS20: cerebral cortex	Strong	Regionally restricted	4b	Expression is present in the outermost layer of the neocortex, with strong expression in the region of the future olfactory lobe, where the neopallial cortex overlies the olfactory epithelium.
TS20: ganglionic eminence	Present	Non-Uniform	4b	Expression is stronger dorsally.
TS20: midbrain	Present		4b
TS20: thalamus	Present		4b
TS20: medulla oblongata	Present	Non-Uniform	4b	Expression is stronger dorsally.
TS20: metencephalon	Present	Non-Uniform	4b	Expression is stronger dorsally.
TS20: cerebellum primordium	Present		4b	Expression is present in the rhombic lip of His.

Structure	Level	Pattern	Image	Note
TS22: cerebral cortex	Present	Regionally restricted	4d	Expression is present in two distinct bands.
TS22: ganglionic eminence	Present		4d
TS22: medulla oblongata	Present		4d
TS22: midbrain	Present		4d
TS22: spinal cord	Present		4d
TS22: tectum	Present		4d

Structure	Level	Pattern	Image	Note
TS27: neocortex layer	Present	Non-Uniform	4f	Expression is present in all layers.
TS27: cortical layer II	Present		4f	This is the layer with the strongest expression level.

Structure	Level	Pattern	Image	Note
TS27: neocortex layer	Present	Non-Uniform	4h	Expression is present in all layers.
TS27: cortical layer II	Present		4h	This is the layer with the strongest expression level.

Structure	Level	Pattern	Image	Note
TS28: cortical layer II	Present		5d , 5b	The strongest cortical expression level is found in the granule cells of layer 2.
TS28: hippocampus	Present	Non-Uniform	5d , 5b
TS28: dentate gyrus granule cell layer	Present		5b , 5d	This is one of the regions of strongest expression in the hippocampus.
TS28: hippocampus pyramidal cell layer	Present		5b , 5d	This is one of the regions of strongest expression in the hippocampus.

Structure	Level	Pattern	Image	Note
TS28: main olfactory bulb	Strong	Regionally restricted	5f	There is strong expression in the neuronal layers.

Structure	Level	Pattern	Image	Note
TS27: cerebellum	Present	Non-Uniform	6b	Structural definition is not yet distinct.
TS27: cerebellum external granule cell layer	Present		6b

Structure	Level	Pattern	Image	Note
TS28: cerebellum Purkinje cell layer	Strong		6d , 6f
TS28: cerebellum granule cell layer	Strong		6d , 6f